Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

TAN Wei-Shi; YOU Biao; ZHANG Jie-Qiu; WU Xiao-Shan; HU An; JIANG Shu-Sheng; WANG Jun; JIA Quan-Jie; ZHANG Wen-Li; JIANG Xiao-Ming

Chinese Physics C> 2001, Vol. 25> Issue(S1) : 106-109

Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

National Laboratory of Solid State Microstructures,Department of Physics,Nanjing 210093,China2 Institute of High Energy Physics,CAS,Beijing 100039,China

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The first and second antiferromagnetic oscillation peaks with respect to the spacer thichness of Cu in Co/Cu multilayers are determined.With the combination of the first and second oscillation peaks,[Co(2 nm)/Cu(t1)/Co(2 nm)/Cu(t2)]₃₀ multilayer is fabricated and characterized.In contrast to the first and second oscillation peak samples ([Co(2 nm)/Cu(t1)]₃₀)and ([Co(2 nm)/Cu(t2)]₃₀),the enhancement of magnetoresistance(MR) in this combinated multilayer is observed.We believe that the enhancement of MR in the combinated sample is due to the added coupling between Co(2 nm)/Cu(t1)and Co(2 nm)/Cu(t2).

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TAN Wei-Shi, YOU Biao, ZHANG Jie-Qiu, WU Xiao-Shan, HU An, JIANG Shu-Sheng, WANG Jun, JIA Quan-Jie, ZHANG Wen-Li and JIANG Xiao-Ming. Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak[J]. Chinese Physics C, 2001, 25(S1): 106-109.

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Received: 1900-01-01
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通讯作者: 陈斌, [email protected]

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沈阳化工大学材料科学与工程学院沈阳 110142

Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

Corresponding author: TAN Wei-Shi,

National Laboratory of Solid State Microstructures,Department of Physics,Nanjing 210093,China2 Institute of High Energy Physics,CAS,Beijing 100039,China

Received Date: 1900-01-01

Accepted Date: 1900-01-01

Available Online: 2001-06-22

Abstract: The first and second antiferromagnetic oscillation peaks with respect to the spacer thichness of Cu in Co/Cu multilayers are determined.With the combination of the first and second oscillation peaks,[Co(2 nm)/Cu(t1)/Co(2 nm)/Cu(t2)]₃₀ multilayer is fabricated and characterized.In contrast to the first and second oscillation peak samples ([Co(2 nm)/Cu(t1)]₃₀)and ([Co(2 nm)/Cu(t2)]₃₀),the enhancement of magnetoresistance(MR) in this combinated multilayer is observed.We believe that the enhancement of MR in the combinated sample is due to the added coupling between Co(2 nm)/Cu(t1)and Co(2 nm)/Cu(t2).

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Magnetoresistance and Structural Studies on Co/Cu Multilayers with the Combination of the first and Second Antiferromagnetic Oscillation Peak

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