Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

WANG Jie; ZHANG Bo; XU Yan-Hui; WEI Wei; FAN Le; PEI Xiang-Tao; HONG Yuan-Zhi; WANG Yong

doi:10.1088/1674-1137/39/12/127007

Chinese Physics C> 2015, Vol. 39> Issue(12) : 127007 DOI: 10.1088/1674-1137/39/12/127007

Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

1.
National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

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Abstract：
TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin film coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H₂ pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2-4 nm, but for Pd film it is large, about 17-19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.
- TiZrV-Pd ,
- nonevaporable getters ,
- film coating ,
- dc magnetron sputtering

References

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WANG Jie, ZHANG Bo, XU Yan-Hui, WEI Wei, FAN Le, PEI Xiang-Tao, HONG Yuan-Zhi and WANG Yong. Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering[J]. Chinese Physics C, 2015, 39(12): 127007. doi: 10.1088/1674-1137/39/12/127007

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Received: 2015-04-02

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Supported by National Natural Science Funds of China (11205155) and Fundamental Research Funds for the Central Universities (WK2310000041)

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通讯作者: 陈斌, [email protected]

1.
沈阳化工大学材料科学与工程学院沈阳 110142

Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

Corresponding author: ZHANG Bo,

1. National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China

Received Date: 2015-04-02

Available Online: 2015-12-20

Fund Project: Supported by National Natural Science Funds of China (11205155) and Fundamental Research Funds for the Central Universities (WK2310000041)

Abstract: TiZrV film is mainly applied in the ultra-high vacuum pipes of storage rings. Thin film coatings of palladium, which are added onto the TiZrV film to increase the service life of nonevaporable getters and enhance H₂ pumping speed, were deposited on the inner face of stainless steel pipes by dc magnetron sputtering using argon gas as the sputtering gas. The TiZrV-Pd film properties were investigated by atomic force microscope (AFM), scanning electron microscope (SEM), X-ray photoelectron spectroscopy (XPS) and X-Ray Diffraction (XRD). The grain size of TiZrV and Pd films were about 0.42-1.3 nm and 8.5-18.25 nm respectively. It was found that the roughness of TiZrV films is small, about 2-4 nm, but for Pd film it is large, about 17-19 nm. The PP At. % of Pd in TiZrV/Pd films varied from 86.84 to 87.56 according to the XPS test results.

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Deposition and characterization of TiZrV-Pd thin films by dc magnetron sputtering

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